What Are the Challenges in Using Sputtering for Catalysis?
While sputtering offers many advantages, it also comes with challenges:
1. Target Material Limitations: Not all materials are suitable for sputtering, and some may require specialized targets or sputtering conditions. 2. Deposition Rate: The sputtering rate can be relatively slow compared to other deposition methods, which may limit its scalability for industrial applications. 3. Equipment Costs: High-quality sputtering equipment can be expensive, which might be a barrier for some research and development projects.
