Sputtering can improve catalyst performance in several ways:
1. Uniformity and Thickness Control: Sputtering provides excellent control over the thickness and uniformity of the deposited film, ensuring a consistent catalytic surface. 2. Nanostructuring: By adjusting the sputtering parameters, it is possible to create catalysts with nanostructured surfaces, which can offer high surface area and enhanced catalytic activity. 3. Composition Tuning: Sputtering allows for precise control over the composition of the catalyst, enabling the creation of custom alloys or multilayer structures that can optimize catalytic properties.
