What Are the Different Types of Sputtering Techniques?
There are several types of sputtering techniques, each with its advantages and applications in catalysis:
1. DC Sputtering: Direct Current (DC) sputtering is commonly used for conductive materials. It involves applying a constant voltage to create a plasma, which bombards the target material. 2. RF Sputtering: Radio Frequency (RF) sputtering is suitable for both conductive and non-conductive materials. It uses an alternating current to generate the plasma. 3. Magnetron Sputtering: This technique uses a magnetic field to confine the plasma close to the target surface, increasing the sputtering rate and efficiency. It is widely used for producing high-quality thin films. 4. Reactive Sputtering: In this method, a reactive gas is introduced into the sputtering chamber, forming compounds with the target material. This is useful for creating catalytic materials like oxides or nitrides.
