What is Metal Organic Chemical Vapor Deposition (MOCVD)?
Metal Organic Chemical Vapor Deposition (MOCVD) is a technique used for depositing thin films of metals and metal oxides onto substrates. It involves the decomposition of metal-organic precursor compounds in the vapor phase, which then react or decompose on the substrate to form a thin film. This process is widely used in the semiconductor industry and for the fabrication of advanced materials.
