Chemical vapor deposition (CVD) is a widely-used technique for creating high-quality, high-performance solid materials. This process is commonly employed in the semiconductor industry to produce thin films and coatings. In CVD, a substrate is exposed to volatile precursor compounds that react and decompose on its surface, depositing a thin solid film. The process parameters, such as temperature, pressure, and the nature of the precursors, can be finely tuned to achieve the desired film properties.
