There are several types of CVD processes, each with unique features and applications:
Thermal CVD: Uses high temperatures to drive the deposition reaction. Plasma-Enhanced CVD (PECVD): Utilizes plasma to enhance chemical reactions at lower temperatures. Metal-Organic CVD (MOCVD): Involves metal-organic precursors, often used for depositing complex materials. Atomic Layer Deposition (ALD): A highly controlled CVD variant that deposits one atomic layer at a time.
