What are the Advantages of Photochemical Deposition?
1. Controlled Deposition: This method allows for precise control over the deposition rate and thickness of the catalytic material. 2. Mild Conditions: Photochemical deposition often occurs under mild conditions (ambient temperature and pressure), which helps preserve the integrity of the substrate and the deposited material. 3. Selective Deposition: The technique enables selective deposition on specific areas of the substrate, which is beneficial for creating patterned or microstructured catalysts. 4. High Purity: The process can result in high-purity deposits due to the specific activation of the precursor by light.
