How does PECVD Compare to Other Deposition Methods?
Compared to other deposition techniques like Physical Vapor Deposition (PVD) and thermal CVD, PECVD offers several advantages:
Lower Temperature: Unlike thermal CVD, PECVD can deposit films at significantly lower temperatures, making it suitable for temperature-sensitive substrates. Higher Deposition Rates: PECVD can achieve higher deposition rates than PVD, making it more efficient for large-scale applications. Versatility: PECVD can be used to deposit a wide range of materials, including oxides, nitrides, and polymers, offering greater flexibility in catalyst design.
