Physical Vapor Deposition (PVD) is a versatile vacuum deposition method used to produce thin films and coatings. In the context of catalysis, PVD is employed to create catalytic surfaces with specific properties. PVD techniques involve the transformation of a solid material into its vapor phase and subsequent condensation onto a substrate, forming a thin film. This process is characterized by its ability to coat complex geometries and achieve high-purity, uniform coatings.
