Chemical Vapor Deposition (CVD) is highly effective for depositing thin films of the active component onto a substrate. It offers several advantages:
- Precision: Allows precise control over the film thickness and composition. - Uniformity: Produces uniform coatings with excellent coverage. - Versatility: Can be used to prepare a wide range of catalysts, including metal oxides, nitrides, and carbides.
However, CVD requires specialized equipment and can be expensive, limiting its use in large-scale applications.
