Coating the Substrate: A substrate is coated with a resist that is sensitive to electron exposure. Pattern Writing: A focused electron beam is used to write the desired pattern onto the resist. The beam's interaction with the resist causes changes in its solubility. Development: The exposed or unexposed areas of the resist are removed using a developer solution, leaving behind the patterned resist. Etching or Deposition: The pattern can then be transferred to the substrate through etching or material deposition techniques.
