How are Thin Films Prepared for Catalytic Applications?
Several methods exist for preparing thin films, each with its own set of advantages and limitations:
1. Physical Vapor Deposition (PVD): This method involves the vaporization of a solid material, which then condenses onto a substrate to form a thin film. Techniques like sputtering and thermal evaporation are commonly used. 2. Chemical Vapor Deposition (CVD): In CVD, gaseous precursors react on the substrate surface to form a thin film. This technique allows for precise control over film composition and thickness. 3. Atomic Layer Deposition (ALD): ALD is a highly controlled technique that deposits thin films one atomic layer at a time. This method is particularly useful for creating films with atomic-scale precision.
